The Lam (OnTrak) Integra is a cluster tool that integrates with a Chemical Mechanical Polishing (CMP) unit in the cleanroom. The Integra uses proven Synergy cleaning technology. The Integra system is designed to clean wafers using options for a variety of chemical processes which operate in conjunction with the mechanical processes. Integra is a continuous feed system that does not process individual cassettes of wafers. The Integra can clean 150 mm and 200 mm wafers (standard). The scrubber is composed of four (4) stations and an electrical enclosure which operate together to achieve processing requirements for semiconductor wafer cleaning. The major system components include:
Input robot for the delivery of a single wafer to the input station where it is rinsed and transferred to the first brush stations. Brush station #1 is the first brush stations. The first scrub process is performed on PVA brushes using DI water and dilute cleaning chemistries. This process is repeated in Brush station #2. The spin station is the third processing station: wafers receive a final rinse, followed by a spin dry in the SRD while a heat lamp assists in the completion of the drying process. This station may also included an optional Megasonic cleaning station and/ or dilute chemical dispense prior to final rinse. Wafers are transported out of the spin stations using an unload handler/ mechanical arm which transfers the clean wafers to the output station. The output station contains a wafer indexer that receives the wafers from the transfer arm and load the clean dry wafers into a cassette for transfer to the next processing step.