Rudolph Technology Auto EL III Ellipsometer:

The AutoEL III is designed to provide precision film thickness measurements with simplicity of use.  Internal data reduction software offers the convenience of automatically transforming delta and psi into the physical properties of thickness and refractive index.  The system’s non-volatile memory allows users to retrieve previously determined sample parameters during future measurements, to speed repeated analyses of similar materials.  The system's thermal printer can provide a hard copy of the results.

Specifications:
Operating Principle: Null Seeking
Operating Wavelength: 632.8nm
Light Source: HeNe Laser
Resolution and Accuracy:
            Polarizer or analyzer  0.05º
            Delta  0.1º
            Psi     0.05º
Resolution and accuracy of measured film thickness and film or substrate refractive index depends on the film-substrate system and the film thickness. Accuracy of 3 to 10 Å and 0.01 refractive index units are typical for silicon oxide films on silicon.
Angle of Incidence:
Standard pin locations 70º±0.02º and 90º± 0.02º
Optional pin locations 60º to 80º
Option pin locations are available at additional cost.  Non-pin located angles may be set with specially cut alignment prisms.
Measuring Time (No calculations):
            Typical            17 seconds
            Maximum       50 seconds

     Photo of Rudolph Auto El      Ellipsometer:

     AutoEL III Performance:

Thickness Range:
10Å to 3.0µ

Repeatability:
≤Å or 1%, Whichever is greater

Accuracy:
±3Å (Compared to NIST wafers)
±0.005 (Refractive index)

AutoEL III Film Thickness Applications:

Si02 /Si    
Si3N4 /Si
Resist/Si
Si3N4/Si02/SI
Resist/Si02/Si
Polysilicon/Si02 Si
Thin metal film
Organic films
Glass, GaAs, Metal
Resist on CD masters