AMAT Refurbished CMP Equipment
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For AMAT refurbished equipment: For AMAT spare parts and upgrades: For AMAT equipment service / maintenance:  |
AMAT Mirra Reflexion LK CMP SystemThe Applied Reflexion LK CMP system provides production-proven, high performance planarization solutions for copper damascene, shallow trench isolation (STI), oxide, polysilicon, and tungsten applications. Its high-speed planarizing platens and multi-zone polishing heads enable superior uniformity and efficiency with low downforce for extendibility to < 45 nm device generations. The integrated post-CMP Desica cleaner uses unique full-immersion Marangoni vapor drying technology to virtually eliminate watermark defects and dramatically reduce particle contamination. The Applied Reflexion LK CMP system also implements a full suite of endpoint methods, in-line metrology and advanced process control capabilities that ensure excellent within-wafer and wafer-to-wafer process control and repeatability for all planarization applications. |
Preventative Maintenance ProgramOverview of Service
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