Focus FE-VII
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For Rudolph ellipsometer refurbished CMP equipment: For Rudolph ellipsometer CMP spare parts: For Rudolph ellipsometer service or maintenance:  |
The Rudolph FE VII Focus Ellipsometer is designed to provide precision film thickness measurements with simplicity of use. The system's long-life HeNe laser provides high signal to noise ratio for repeatability and the wavelength accuracy of an atomic transition. Using the same first principle measurement technique used by NIST to calibrate thickness reference standards, Rudolph Technology's FE VII provides accurate and repeatable results on applications throughout the fab. The FE VII-D's advanced Focused Beam™ system uses dual wavelength technology to directly measure the sample with a small spot at multiple angles of incidence and at multiple wavelengths. This allows the system to define more variables, increasing the certainty of the results on complex multi-layer films. The FE VII provides fast reliable data across a wide range of applications. Typical applications include measuring sub 30 Angstrom gates, thick polyimide, ILD on ARC, or small-spot multi-parameter processes. The multi-parameter power of the FE VII also allows calculation of up to six unknowns on complex multi-layer film stacks, such as OPO and ONO, resulting in both film thickness as well as film composition. Focus FE VII Series Features:
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Preventative Maintenance ProgramOverview
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