For Rudolph ellipsometer refurbished CMP equipment:
For Rudolph ellipsometer CMP spare parts:
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The Rudolph FE III Focus Ellipsometer is designed to provide precision film thickness measurements with simplicity of use. The system's long-life HeNe laser provides high signal to noise ratio for repeatability and the wavelength accuracy of an atomic transition. Using the same first principle measurement technique used by NIST to calibrate thickness reference standards, Rudolph Technology's FE III provides accurate and repeatable results on applications throughout the fab.
The FE III-D's advanced Focused Beam system uses dual wavelength technology to directly measure the sample with a small spot at multiple angles of incidence and at multiple wavelengths. This allows the system to define more variables, increasing the certainty of the results on complex multi-layer films. The FE III provides fast reliable data across a wide range of applications. Typical applications include measuring sub 30 Angstrom gates, thick polyimide, ILD on ARC, or small-spot multi-parameter processes.
Focus FE III Series Features:
System: The Rudolph FE III series is a focused beam ellipsometer for simultaneous multi-angle measurements. In addition, multi-wavelength measurement capabilities are available using the optional second light source on the Rudolph FE III-D.
632.8 nm HeNe Laser, 780 nm laser diode (optional second light source)
12X24 um test site: de-skew only 125 um, site by site 50 um
Optional pattern recognition, edge or gray scale detection, manual or auto de-skew, re-teach
3-axis robot with random access to three cassettes for 100 mm, 150 mm, and 200 mm wafers
Virtual flat/ notch finder, x, y, centering +/-50 um, theta +/-0.1 deg., de-skew +/-5 um
Accuracy: 7um over 200 mm, repeatability: +/-1 um
Preventative Maintenance Program